Anthony (Tony) Yen joined ASML in 2017 as Vice President, Technology Development Center (TDC), bringing more than 25 years of experience in the semiconductor industry.
Previously, Tony joined TSMC in 1997 to lead its newly formed lithography R&D group. From 2001-2003, he co-led SEMATECH’s Lithography Division to build infrastructure for next-generation lithography technologies. After a three-year stint at Cymer (now part of ASML) as senior vice president responsible for marketing, he returned to TSMC toward the end of 2006 as head of the Nanopatterning Technology Infrastructure Division. He was responsible for developing EUV lithography, including its mask technology, for high-volume manufacturing at TSMC.
Tony began his study of nanopatterning as a graduate student at MIT and subsequently worked on resolution enhancement techniques in photolithography at Texas Instruments (TI) and, as a TI assignee, at IMEC. Tony received his BSEE degree from Purdue University and his SM, EE, PhD, and MBA degrees from MIT. He has close to 100 publications and holds more than 100 U.S. patents on nanopatterning and related subjects. He is a fellow of IEEE and SPIE, and was named an outstanding alumnus by Purdue University School of Electrical and Computer Engineering in 2018.